YAMADA Isao | Ion Beam Engineering Experimental Laboratory, Kyoto University

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概要

• 同名の論文著者
• Ion Beam Engineering Experimental Laboratory, Kyoto Universityの論文著者

関連著者

• YAMADA Isao

  Ion Beam Engineering Experimental Laboratory, Kyoto University

• Yamada Isao

  Ion Beam Engineering Experimental Laboratory Kyoto University

• Takaoka G

  Kyoto Univ. Kyoto Jpn

• Takaoka Gikan

  Ion Beam Engineering Experimental Laboratory Kyoto University

• Matsuo Jiro

  Ion Beam Engineering Experimental Laboratory Kyoto University

• FUKUSHIMA Kazunori

  Faculty of Engineering, Setsunan University

• Fukushima Kazunori

  Faculty Of Engineering Setsunan University

• Matsuo J

  Fujitsu Lab. Atsugi

• Akizuki Makoto

  Ion Beam Engineering Experimental Laboratory Kyoto University

• Harada M

  National Res. Inst. Metals Ibaraki Jpn

• Fukushima K

  Institute Of Industrial Science University Of Tokyo

• Ogasawara Satoru

  Microelectronics Research Center, SANYO Electric Co., Ltd.,

• Harada Mitsuaki

  Microelectronics Research Center, SANYO Electric Co., Ltd.,

• Doi Atsumasa

  Microelectronics Research Center, SANYO Electric Co., Ltd.,

• Harada Mitsuaki

  Microelectronics Research Center Sanyo Electric Co. Ltd.

• Doi Atsumasa

  Microelectronics Research Center Sanyo Electric Co. Ltd.

• Ogasawara Satoru

  Microelectronics Research Center Sanyo Electric Co. Ltd.

• Yamada I

  Himeji Inst. Of Technol. Hyogo Jpn

• Inokawa Hiroshi

  Ion Beam Engineering Experimental Laboratory Kyoto University

• TAKAGI Toshinori

  Ion Beam Engineering Experimental Laboratory, Kyoto University

• Yamada I

  Himeji Inst. Technol. Hyogo Jpn

• Takagi Toshinori

  Ion Beam Engineering Experimental Laboratory Kyoto University

• AKIZUKI Makoto

  Microelectronics Research Center, SANYO Electric Co., Ltd.

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著作論文

• Observation of Initial Stage of Al Epitaxial Growth on Si(111) by Ionized Cluster Beam Deposition
• Ionized Cluster Beams : Physics and Technology
• Effects on CO Oxidation Activity of Nano-Scale Au Islands and TiO_2 Support Prepared by the Ionized Cluster Beam Method
• Epitaxial Growth of TiO_2 Rutile Thin Films on Sapphire Substrates by a Reactive Ionized Cluster Beam Method
• Low-Temperature Oxidation of Silicon by O_2 Cluster Ion Beams
• A New Low-Temperature Oxidation Technique by Gas Cluster Ion Beams
• Microhardness and Strain Depth Profiles in Nitrogen-Implanted TiO_2 Films

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