ISHIKAWA H. | Research Center for Nano-Device and System, Nagoya Institute of Technology
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概要
- ISHIKAWA H.の詳細を見る
- 同名の論文著者
- Research Center for Nano-Device and System, Nagoya Institute of Technologyの論文著者
関連著者
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Arulkumaran S.
Research Center For Nano-device And System Nagoya Institute Of Technology
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Ishikawa Hiroyasu
Nagoya Inst. Of Technol. Nagoya Jpn
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EGAWA T.
Research Center for Nano-Device and System, Nagoya Institute of Technology
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ISHIKAWA H.
Research Center for Nano-Device and System, Nagoya Institute of Technology
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Egawa T.
Research Center For Nano-device And System Nagoya Institute Of Technology
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Jimbo T.
Research Center for Nano-Device and System, Nagoya Institute of Technology
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Jimbo T.
Research Center For Nano-device And System Nagoya Institute Of Technology
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Imanishi A.
Research Center for Nano-Device and System, Nagoya Institute of Technology
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Imanishi A.
Research Center For Nano-device And System Nagoya Institute Of Technology
著作論文
- Enhancement of breakdown voltage in AlGaN/GaN HEMTs using AlN buffer layer thickness on 4-inch Silicon
- Studies of AlGaN/GaN HEMTs on 4-inch Silicon substrate(Session A6 Compound Semiconductor Devices III)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Studies of AlGaN/GaN HEMTs on 4-inch Silicon substrate(Session A6 Compound Semiconductor Devices III)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Effects of device passivation on AlGaN/GaN HEMTs using electron beam evaporated SiO2 and Si3N4 (Devices:先端デバイスの基礎と応用に関するアジアワークショップ)
- Studies of electron beam evaporated SiO_2/AlGaN/GaN-metal-oxide-semiconductor HEMTs on sapphire substrate
- Studies of electron beam evaporated SiO_2/AlGaN/GaN-metal-oxide-semiconductor HEMTs on sapphire substrate
- Studies of AlGaN/GaN High Electron Mobility Transistors on Semi-Insulating Silicon Carbide and Sapphire Substrates