SUGIMOTO Yoshimasa | Optoelectronics Technology Research Laboratory

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概要

• Sugimoto Yoshimasaの詳細を見る
• 同名の論文著者
• Optoelectronics Technology Research Laboratoryの論文著者

関連著者

• SUGIMOTO Yoshimasa

  Optoelectronics Technology Research Laboratory

• Sugimoto Y

  Department Of Research And Development Nichia Chemical Industries Ltd

• Akita K

  Optoelectronics Technology Research Laboratory

• Hidaka Hiroshi

  Optoelectronics Technology Research Laboratory

• Taneya M

  Devices Technology Research Laboratories Sharp Corporation

• Taneya Mototaka

  Central Research Laboratories Engineering Center Sharp Corporation

• AKITA Kenzo

  Optoelectronics Technology Research Laboratory

• Ishikawa T

  Riken Harima Institute

• Ishikawa T

  National Space Dev. Agency Of Japan Ibaraki Jpn

• Ishikawa T

  Kyushu Univ. Fukuoka Jpn

• TANAKA Nobuyuki

  The Kochi Prefectural Makino Botanical Garden

• Tanaka N

  Environmental Sci. Res. Niigata Niigata Jpn

• Ishikawa Tetsuya

  Riken Harima Institute

• Kawanishi Hideo

  Department Of Electonic Engineering Kogakuin University

• Ishikawa Tomonori

  Fujitsu Limited

• Ishikawa Tomonori

  Optoelectronics Technology Research Laboratory

• Ishikawa Takatoshi

  Department Of Applied Physics Faculty Of Science Fukuoka University

• TANAKA Nobuyuki

  Optoelectronics Technology Research Laboratory

• TANEYA Mototaka

  Optoelectronics Technology Research Laboratory

• Kawanishi H

  Department Of Electronic Engineering Kohgakuin University

• KAWANISHI Hidenori

  Optoelectronics Technology Research Laboratory

• Tanaka N

  The Kochi Prefectural Makino Botanical Garden

• Ohki Yoshimasa

  Optoelectronics Technology Research Laboratory

• HIRATANI Yuji

  Optoelectronics Technology Research Laboratory

• Taneya Mototaka

  Central Research Laboratories Corporate R & D Group Sharp Corporation

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著作論文

• Selective Area Epitaxy of GaAs Using GaAs Oxide as a Mask
• Fine Pattern Formation of Gallium Arsenide by In Situ Electron-Beam Lithography Using an Ultrathin Surface Oxide as a Resist
• Electron-Beam-Induced Cl_2 Etching of GaAs
• Sub-100 nm Patterning of GaAs Using In Situ Electrom Beam Lithography
• Role of an Electron Beam in the Modification of a GaAs Oxide Mask for in situ EB Lithography

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