ODA Noriaki | Advanced Device Development Division, NEC Electronics Corporation
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概要
関連著者
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KAWAHARA Naoyoshi
Advanced Device Development Division, NEC Electronics Corporation
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ODA Noriaki
Advanced Device Development Division, NEC Electronics Corporation
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KAMEYAMA Akiko
NEC Electronics Corporation
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UENO Kazuyoshi
Advanced Device Development Division, NEC Electronics Corporation
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KAMEYAMA Akiko
Advanced Device Development Division, NEC Electronics Corporation
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MATSUMOTO Akira
Advanced Device Development Division, NEC Electronics Corporation
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IGUCHI Manabu
Advanced Device Development Division, NEC Electronics Corporation
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TAKEWAKI Toshiyuki
Advanced Device Development Division, NEC Electronics Corporation
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TOYOSHIMA Hironori
Advanced Device Development Division, NEC Electronics Corporation
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SUZUKI Mieko
Advanced Device Development Division, NEC Electronics Corporation
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Takewaki Toshiyuki
Nec Electronics Corporation
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Iguchi Manabu
Nec Electronics Corporation
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Suzuki Mieko
Nec Electronics Corporation
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OSHIDA Daisuke
Advanced Device Development Division, NEC Electronics Corporation
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ASADA Susumu
Advanced Device Development Division, NEC Electronics Corporation
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Asada Susumu
Advanced Device Development Division Nec Electronics Corporation
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Oshida Daisuke
Advanced Device Development Division Nec Electronics Corporation
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UENO Kazuyoshi
Department of Neurosurgery,Hokkaido University School of Medicine
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Oda Noriaki
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Kakuhara Yumi
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Kakuhara Yumi
Advanced Device Development Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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Takewaki Toshiyuki
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Ueno Kazuyoshi
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Ueno Kazuyoshi
Department of Electronic Engineering, Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan
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Toyoshima Hironori
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Kawahara Naoyoshi
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Suzuki Mieko
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Asada Susumu
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Kameyama Akiko
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
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Oshida Daisuke
Advanced Device Development Division, NEC Electronics Corporation, Sagamihara, Kanagawa 229-1198, Japan
著作論文
- Time-Dependent Dielectric Breakdown Characterization of 90- and 65-nm-Node Cu/SiOC Interconnects with Via Plugs
- Electromigration Lifetime Enhancement of CoWP Capped Cu Interconnects by Thermal Treatment
- Time-Dependent Dielectric Breakdown Characterization of 90- and 65-nm-Node Cu/SiOC Interconnects with Via Plugs