Ohji Yuzuru | Central Research Laboratory Hitachi
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概要
関連著者
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Ohji Yuzuru
Central Research Laboratory Hitachi
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TANIGAWA Shoichiro
Institute of Materials Science, The University of Tsukuba
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UEDONO Akira
Institute of Materials Science, University of Tsukuba
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Uedono A
Univ. Tsukuba Tsukuba Jpn
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Uedono Akira
Institute Of Applied Physics University Of Tsukuba
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WEI Long
Institute of Materials Science, University of Tsukuba
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Wei L
Institute Of Materials Science University Of Tsukuba
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Wei Long
Institute Of Materials Science University Of Tsukuba
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SUGANO Takuo
Department of Electrical and Electronic Engineering, Toyo University
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Asada Kunihiro
Department Of Electrical And Electronic Engineering Tokyo University
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Tanigawa Shoichiro
Institute Of Applied Physics University Of Tsukuba
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Torii Kazuyoshi
Central Research Laboratory Hitachi Lid.
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Ohji Y
Advanced Device Development Department Renesas Technology Corporation
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Ohji Yuzuru
Central Research Laboratory Hitachi Ltd.
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Miki Hiroshi
Central Research Laboratory Hitachi Ltd.
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Saitoh Sakae
Central Research Laboratory Hitachi Ltd.
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Tanigawa S
Institute Of Applied Physics University Of Tsukuba
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Ohmameuda Toshiaki
Department Of Information And Image Sciences Chiba University
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Miki Hiroshi
Department Of Chemistry Nagaoka University Of Technology
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Miki Hiroshi
Central Research Laboratory Hitachi Limited
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Uedono Akira
Institute of Applied Physics and Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba 305-8573, Japan
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Miki Hiroshi
central Research Laboratory, Hitachi, Ltd.
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OHJI Yuzuru
Central Research Laboratory, Hitachi
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OHMAMEUDA Toshiaki
Department of Electronic Engineering, The University of Tokyo
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MIKI Hiroshi
Department of Electronic Engineering, The University of Tokyo:(Present address)Central Research Laboratory
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Miki Hiroshi
Department of Applied Science for Electronics and Materials, Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan
著作論文
- Defects in SiO_2 /Si Structures Probed by Using a Monoenergetic Positron Beam
- Uniform Ultra-Thin Pb(Zr, Ti)O_3 Films Formed by Metal-Organic Chemical Vapor Deposition and Their Electrical Characteristics ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Preparation of Lead Zirconate Titanate Thin Films by Reactive Evaporation ( FERROELECTRIC MATERIALS AND THEIR APPLICATIONS)
- Thermodynamical Calculation and Experimental Confirmation of the Density of Hole Traps in SiO_2 Films