Li Jiang | Yokohama R&d Laboratories The Furukawa Electric Co. Ltd
スポンサーリンク
概要
関連著者
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Li Jiang
Yokohama R&d Laboratories The Furukawa Electric Co. Ltd
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Yoshida Seikoh
Yokohama R & D Laboratories The Furukawa Electric Co. Ltd.
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YOSHIDA Seikoh
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd
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Wada Takahiro
Yokohama R&d Laboratories The Furukawa Electric Co. Ltd
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IKEDA Nariaki
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd.
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LI Jiang
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd.
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TAKEHARA Hironari
Yokohama R&D Laboratories, The Furukawa Electric Co., Ltd.
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Ikeda Nariaki
Yokohama R&d Laboratories The Furukawa Electric Co. Ltd
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Takehara Hironari
Yokohama R&d Laboratories The Furukawa Electric Co. Ltd
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Yoshida Seikoh
Furukawa Electric Co. Ltd. Yokohama Jpn
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Ootomo Shinya
Yokohama R&d Laboratories The Furukawa Electric Co. Ltd.
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Sawano Kentarou
Research Center For Silicon Nano-science Advanced Research Laboratories Musashi Institute Of Technol
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Nomura Takehiko
Yokohama R&d Laboratories The Furukawa Electric Co. Ltd.
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Shiraki Yasuhiro
Research Center For Advanced Science And Technology (rcast) The University Of Tokyo
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Niiyama Yuki
Yokohama R&D Laboratory, The Furukawa Electric Co., Ltd., 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan
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Kambayashi Hiroshi
Yokohama R&D Laboratory, The Furukawa Electric Co., Ltd., 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan
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Kambayashi Hiroshi
Yokohama R&D Laboratory, The Furukawa Electric Co., Ltd., 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan
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Niiyama Yuki
Yokohama R&D Laboratory, The Furukawa Electric Co., Ltd., 2-4-3 Okano, Nishi-ku, Yokohama 220-0073, Japan
著作論文
- Low On-Voltage Operation AlGaN/GaN Schottky Barrier Diode with a Dual Schottky Structure(Power Devices, Fundamental and Application of Advanced Semiconductor Devices)
- Low On-Voltage Operation GaN Based Field Effect Schottky Barrier Diode(Session A7 High Power Devices)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Low On-Voltage Operation GaN Based Field Effect Schottky Barrier Diode(Session A7 High Power Devices)(2004 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD 2004))
- Si Ion Implantation into Mg-Doped GaN for Fabrication of Reduced Surface Field Metal–Oxide–Semiconductor Field-Effect Transistors