Miyashita Toshihiko | Fujitsu Laboratories Ltd.
スポンサーリンク
概要
関連著者
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Miyashita Toshihiko
Fujitsu Laboratories Ltd.
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Hatada Akiyoshi
Fujitsu Microelectonics, Ltd., 1500 Mizono, Tado, Kuwana, Mie 511-0192, Japan
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Hatada Akiyoshi
Fujitsu Laboratories Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japan
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SUZUKI Kunihiro
Fujitsu Laboratories Ltd.
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Ikeda Keiji
Fujitsu Laboratories Ltd.
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AOYAMA Takayuki
Fujitsu Laboratories Lid.
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Satoh Shigeo
Fujitsu Laboratories Ltd.
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Tamura Naoyoshi
Fujitsu Lab. Ltd.
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KURATA Hajime
Fujitsu Laboratories Ltd.
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Aoyama Takayuki
Fujitsu Laboratories Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japan
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Kim Young
Fujitsu Laboratories, Ltd., 1500 Mizono, Tado, Kuwana, Mie 511-0192, Japan
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Satoh Shigeo
Fujitsu Laboratories Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japan
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Nishikawa Masatoshi
Fujitsu Microelectonics, Ltd., 1500 Mizono, Tado, Kuwana, Mie 511-0192, Japan
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Ookoshi Katsuaki
Fujitsu Microelectonics, Ltd., 1500 Mizono, Tado, Kuwana, Mie 511-0192, Japan
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Owada Tamotsu
Fujitsu Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japan
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Shimamune Yousuke
Fujitsu Laboratories Ltd., 50 Fuchigami, Akiruno, Tokyo 193-0197, Japan
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Ikeda Keiji
Fujitsu Laboratories, Ltd., 1500 Mizono, Tado, Kuwana, Mie 511-0192, Japan
著作論文
- Design and Optimization of Gate Sidewall Spacers to Achieve 45 nm Ground Rule for High-Performance Applications
- Extraction of Depth-Dependent Lateral Standard Deviation from One-Dimensional Tilted Implantation Profiles
- Potential of and Issues with Multiple-Stressor Technology in High-Performance 45 nm Generation Devices