Burhanudin Zainal | Research Institue Of Electronics Shizuoka University
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概要
関連著者
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Tabe Michiharu
Research Institue Of Electronics Shizuoka University
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Nuryadi Ratno
Research Institue Of Electronics Shizuoka University
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Burhanudin Zainal
Research Institue Of Electronics Shizuoka University
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Nuryadi Ratno
Research Institute of Electronics, Shizuoka University
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BURHANUDIN Zainal
Research Institue of Electronics, Shizuoka University
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TABE Michiharu
Research Institute of Electronics, Shizuoka University
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Nuryadi Ratno
Department Of Physics Faculty Of Science Shizuoka University
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Nuryadi Ratno
Shizuoka Univ. Hamamatsu Jpn
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Tabe Michiharu
Ntt Lsi Laboratories:(present Address)research Institute Of Electronics Shizuoka University
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Tare Michiharu
Research Institue Of Electronics Shizuoka University
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ブルハヌディン ザイナル
静岡大学電子工学研究所
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ブルハヌディン ザイナル
Research Institue Of Electronics Shizuoka University
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田部 道晴
静岡大学 電子工学研究所
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Burhanudin Zainal
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
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Fan Youjun
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
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Nuryadi Ratno
Research Institute of Electronics, Shizuoka University, 3-5-1 Johoku, Naka-ku, Hamamatsu 432-8011, Japan
著作論文
- Light irradiation effect on single-hole-tunneling current of an SOI-FET(結晶成長評価及びデバイス(化合物,Si, SiGe,その他の電子材料))
- Photon irradiation effects on Si multiple-tunnel-junction field-effect transistors : Sensing the presence of a single-charge in the substrate
- Photon irradiation effects on Si multiple-tunnel-junction field-effect transistors : Sensing the presence of a single-charge in the substrate
- Photon irradiation effects on Si multiple-tunnel-junction field-effect transistors : Sensing the presence of a single-charge in the substrate
- Light irradiation effect on single-hole-tunneling current of an SOI-FET(結晶成長評価及びデバイス(化合物,Si,SiGe,その他の電子材料))
- Light irradiation effect on single-hole-tunneling current of an SOI-FET(結晶成長評価及びデバイス(化合物,Si, SiGe,その他の電子材料))
- Thermal Agglomeration of Ultrathin Silicon-on-Insulator Layers: Crystalline Orientation Dependence