Asano Isamu | Elpida Memory Inc.
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概要
関連著者
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ASANO Isamu
ELPIDA MEMORY, Inc.
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Asano Isamu
Elpida Memory Inc.
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NAKAMURA Yoshitaka
ELPIDA MEMORY, Inc.
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Nakamura Yoshitaka
Elpida Memory Inc.
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Hiratani M
Central Research Laboratory Hitachi Ltd.
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Hiratani M
Central Research Laboratory Hitachi Ltd
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Hiratani Masahiko
Central Research Laboratory Hitachi Ltd.
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Matsui Yasushi
Electronics Research Laboratory Corporate Research & Development Matsushita Electronics Corporat
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Fukuda Naoki
Semiconductor Group Hitachi Ltd.
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AOKI Hideo
Device Development Center, Hitachi Ltd.
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YAMADA Satoru
ELPIDA MEMORY, Inc.
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SEKIGUCHI Toshihiro
ELPIDA MEMORY, Inc.
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Matsui Y
Nims Tsukuba Jpn
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MATSUI Yuichi
Central Research Laboratory, Hitachi, Ltd.
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Sekiguchi Toshihiro
Elpida Memory Inc.
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MATSUI Yoshio
Environmental Pollution Research Institute of Nagoya City
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Matsui Y
Central Research Laboratory Hitachi Ltd.
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Goto Hidekazu
Elpida Memory Inc.
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KAWAGOE Tsuyoshi
Elpida Memory, Inc.
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KUROKI Keiji
Elpida Memory, Inc.
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NAKANISHI Naruhiko
Elpida Memory, Inc.
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Asano I
Elpida Memory Inc. Kanagawa Jpn
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Kuroki Keiji
Elpida Memory Inc.
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MATUSI Yasuji
Product Development Laboratory, Mitsubishi Electric Corporation
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Kawagoe Tsuyoshi
Elpida Memory Inc.
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Nakanishi Naruhiko
Elpida Memory Inc.
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Yamada Satoru
Elpida Memory Inc. Device Development Center Hitachi Ltd.
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Aoki Hideo
Device Development Center Hitachi Ltd.
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Yamada Satoru
Elpida Memory Inc.
著作論文
- A Thermally Robust Ti-Rich TiNx Contact Metallization Realizing and Interconnect System Suitable to 0.10-μm DRAMs and Beyond
- A 500℃ fabrication process for MIM capacitors-based on a Ta_2O_5/Nb_2O_5 bilayer with high permittivity-for DRAM and SoC applications
- Novel Storage-Node Contacts with Stacked Point-Cusp Magnetron Sp-TiN Barrier for Metal-Insulator-Metal Ru/Ta_2O_5/Ru Capacitors in Gigabit Dynamic Random Access Memories