Park J‐s | Hanyang Univ. Kyunggido Kor
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概要
関連著者
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Park J‐s
Hanyang Univ. Kyunggido Kor
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Lee W‐s
Korea Electronics Technology Institute
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Lee Woo-sun
Korea Electronics Technology Institute
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Seo Yong-jin
Department Of Electrical Engineering Daebul University
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Park J
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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Park J
Hyundai Electronics Industries Co. Ltd. Kyoungki‐do Kor
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Lee J
Department Of Electronic Engineering National Chiao Tung University
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Park Jin
Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Han Chang
Memory R&d Division Hyundai Electronics Industries Co.
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Park Jin
R&d Division Lg Semicon. Co. Ltd.
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Ryu Hyun-wook
Research Institute Of Energy Resources Technology Chosun University
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Lee J
National Nano Device Lab. Hsinchu Twn
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Kim Sang-yong
Fab Division Anam Semiconductor Co. Inc.
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Park Kyung-hee
Research Institute Of Energy Resources Technology Chosun University
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Lee Joo
Memory R&d Division Hyundai Electronics Industries Co.
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PARK Ji-Soo
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
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LEE Woo-Sung
Korea Electronics Technology Institute
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Park Jin
Semiconductor R&d Goldstar Electron Co. Ltd.
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LEE JooWan
Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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SEO Yong-Jin
Daebul University
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LEE Woo-Sun
Chosun University
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HONG Kwang-Jun
Chosun University
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SHIN Dong-Charn
Chosun University
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AKBAR Sheikh
CISM
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PARK Jin-Seong
Chosun University
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SEO Yong-Jin
Department of Electrical Engineering, DAEBUL University
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LEE Woo-Sun
Department of Electrical Engineering, CHOSUN University
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PARK Jin-Seong
Department of New Material Engineering, CHOSUN University
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Kim S‐y
Samsung Electronics Co. Ltd. Kyunggi‐do Kor
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Lee Joo
Memory R&d Division Hynix Semiconductor Inc.
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Park Ji-soo
Memory R&d Center Hyundai Electronics Industries Co. Ltd.
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HAN Chang
Memory R&D Center, Hyundai Electronics Industries Co.,Ltd.
著作論文
- Degradation of Ta_2O_5 Gate Dielectric by TiCl_4-Based Chemically Vapor Deposited TiN Film in W/TiN/Ta_2O_5/Si System
- Hillock Formation of SnO_2 Thin Films Prepared by Metal-Organic Chemical Vapor Deposition
- Motor-Current-Based Real-Time End Point Detection of Shallow-Trench-Isolation Chemical Mechanical Polishing Process Using High-Selectivity Slurry