Hisaka Takayuki | High Frequency & Optical Device Works, Mitsubishi Electric Corporation
スポンサーリンク
概要
関連著者
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Hisaka Takayuki
High Frequency & Optical Device Works, Mitsubishi Electric Corporation
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Sasaki Hajime
High Frequency & Optical Device Works, Mitsubishi Electric Corporation
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Yoshida Naohito
High Frequency & Optical Device Works, Mitsubishi Electric Corporation
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Villanueva Anita
Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology
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Seto Hiroki
Graduate School Of Natural Science And Technology Kanazawa University
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Fujino Yuhki
Graduate School Of Natural Science And Technology Kanazawa University
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Aihara Yasuki
High Frequency And Optoelectronic Devices Works Mitsubishi Electric Co. Ltd.
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Totsuka Masahiro
High Frequency And Optoelectronic Devices Works Mitsubishi Electric Co. Ltd.
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Katoh Takayuki
High Frequency & Optical Device Works, Mitsubishi Electric Corporation
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Kanaya Ko
High Frequency & Optical Device Works, Mitsubishi Electric Corporation
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Alamo Jesus
Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology
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Iiyama K
Graduate School Of Natural Science And Technology Kanazawa University
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SETO Hiroki
Graduate School of Natural Science and Technology, Kanazawa University
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IIYAMA Koichi
Graduate School of Natural Science and Technology, Kanazawa University
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TAKAMIYA Saburo
Graduate School of Natural Science and Technology, Kanazawa University
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OHTA Akira
High Frequency & Optical Semi-conductor Business Division, Mitsubishi Electric Corporation
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FUJINO Yuhki
Graduate School of Natural Science and Technology, Kanazawa University
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TOTSUKA Masahiro
High Frequency and Optoelectronic Devices Works, Mitsubishi Electric Co., Ltd.
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AIHARA Yasuki
High Frequency and Optoelectronic Devices Works, Mitsubishi Electric Co., Ltd.
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Takamiya S
Graduate School Of Natural Science And Technology Kanazawa University
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Takamiya Saburo
Graduate School Of Natural Science And Technology Division Of Electrical Engineering And Computer Sc
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Hattori Ryo
High Frequency And Optical Semiconductor Division Mitsubishi Electric Corporation
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Hattori Ryo
High Frequency & Optical Semiconductor Div. Mitsubishi Electric Corporation
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Iiyama Koichi
Graduate School Of Natural Science And Technology Division Of Electrical Engineering And Computer Sc
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NAKAYAMA Yoshikazu
the Department of Physics and Electronics, Osaka Prefecture University
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Heima Tetsuya
High Frequency & Optical Semiconductor Div. Mitsubishi Electric Corporation
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YAJIMA Kotaro
High Frequency & Optical Semiconductor Div., Mitsubishi Electric Corporation
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HIGASHISAKA Norio
High Frequency & Optical Semiconductor Div., Mitsubishi Electric Corporation
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Yajima Kotaro
High Frequency & Optical Semiconductor Div. Mitsubishi Electric Corporation
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Terai Yoshikazu
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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Hisaka Takayuki
High Frequency & Optical Semiconductor Div. Mitsubishi Electric Corporation
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Nakayama Yoshikazu
The Department Of Physics And Electronics Osaka Prefecture University
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Fujiwara Yasufumi
Division Of Materials And Manufacturing Science Graduate School Of Engineering Osaka University
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Higashisaka Norio
High Frequency & Optical Semiconductor Div. Mitsubishi Electric Corporation
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Hayashi Kazuo
High Frequency and Optical Device Works, Mitsubishi Electric Corporation, Itami, Hyogo 664-8641, Japan
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Nogami Yoichi
High Frequency and Optical Device Works, Mitsubishi Electric Corporation, Itami, Hyogo 664-8641, Japan
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del Alamo
Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Room 39-567, Cambridge, MA 02139, U.S.A.
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TERAI Yoshikazu
Division of Materials and Manufacturing Science, Graduate School of Engineering, Osaka University
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Aihara Yasuki
High Frequency and Optoelectronic Devices Works, Mitsubishi Electric Co., Ltd., 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan
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Kadoiwa Kaoru
High Frequency and Optical Devices Works, Mitsubishi Electric Corporation, 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan
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Sasaki Hajime
High Frequency and Optical Device Works, Mitsubishi Electric Corporation, Itami, Hyogo 664-8641, Japan
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Yoshida Naohito
High Frequency and Optical Device Works, Mitsubishi Electric Corporation, Itami, Hyogo 664-8641, Japan
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Villanueva Anita
Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Room 39-567, Cambridge, MA 02139, U.S.A.
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Hisaka Takayuki
High Frequency and Optoelectronic Devices Works, Mitsubishi Electric Co., Ltd., 4-1 Mizuhara, Itami, Hyogo 664-8641, Japan
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Hisaka Takayuki
High Frequency and Optical Device Works, Mitsubishi Electric Corporation, Itami, Hyogo 664-8641, Japan
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Sasaki Hajime
High Frequency & Optical Device Works, Mitsubishi Electric Corporation
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Hisaka Takayuki
High Frequency & Optical Device Works, Mitsubishi Electric Corporation
著作論文
- Simultaneous achievement of high performance and high reliability in a 38/77GHz InGaAs/AlGaAs PHEMT MMIC
- Effect of Oxidation using Ultraviolet Light and Ozone and Subsequent Nitridation using Electron Cyclotron Resonance Plasma on Gate Portion of GaAs Field-Effect Transistors
- Electromigration and Diffusion of Gold in GaAs IC Interconnections(Regular Section)
- Characteristics of SiN/GaAs interface under exposure to high-temperature and high-humidity conditions measured by photoreflectance spectroscopy
- Degradation Mechanism of AlGaAs/InGaAs Power Pseudomorphic High-Electron-Mobility Transistors under Large-Signal Operation
- Effect of Oxidation using Ultraviolet Light and Ozone and Subsequent Nitridation using Electron Cyclotron Resonance Plasma on Gate Portion of GaAs Field-Effect Transistors