Sawai H | Lsi Laboratory Mitsubishi Electric Corporation

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著作論文

High Performance Electron Cyclotron Resonance Plasma Etching with Control of Magnetic Field Gradient : Etching
High Performance Electron Cyclotron Resonance Plasma Etching with Control of Magnetic Field Gradient
Highly Selective AlSiCu Etching Using BBr_3 Mixed-Gas Plasma : Etching and Deposition Technology
ECR Plasma Etching with Heavy Halogen Ions : Etching and Deposition Technology
Highly Selective AlSiCu Etching Using BBr_3 Mixed-Gas Plasma
ECR Plasma Etching with Heavy Halogen Ions
Very-Low-Temperature Preparation of Poly-Si Films by Plasma Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
Plasma Etching of ITO Thin Films Using a CH_4/H_2 Gas Mixture

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