HAN Min-Koo | Room 1102, School of Electrical Engineering, Seoul National University
スポンサーリンク
概要
関連著者
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Han M‐k
The Author Is With The School Of Electrical Engineering Seoul National University
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Park C‐m
Samsung Electronics Co. Ltd. Kyungki‐do Kor
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Han M‐k
Seoul Nat'l Univ. Seoul Kor
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PARK Cheol-Min
Room 1102, School of Electrical Engineering, Seoul National University
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YOO Juhn-Suk
Room 1102, School of Electrical Engineering, Seoul National University
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HAN Min-Koo
Room 1102, School of Electrical Engineering, Seoul National University
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Yoo Juhn-suk
The Author Is With The School Of Electrical Engineering Seoul National University
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Park Cheol-min
School Of Electrical Engineering Seoul National University
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Park Cheol-min
Room 1102 School Of Electrical Engineering Seoul National University
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Yoo Juhn-suk
Department Of Electrical Engineering Seoul National University
著作論文
- Characteristics of New Poly-Si Thin Transistor with a-Si Channel Region Near the Source/Drain
- A Characteristics of Buried Channel Poly-Si TFTs
- In-Situ Fabrication of Gate Oxide and Poly-Si Film by XeCl Excimer Laser Annealing
- Insitu Fabrication of High Quality Oxide and Poly-Si Film by Excimer Laser Irradiation