ROH Jae-Sung | Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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概要
関連著者
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ROH Jae-Sung
Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co., Ltd.
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Roh Jae-sung
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Roh Jae-sung
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Roh J‐s
Memory Research And Development Division Hynix Semiconductor Inc.
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CHO Heung-Jae
Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.
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PARK Dae-Gyu
Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.
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YEO In-Seok
Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.
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Cho Heung-jae
Memory R&d Division Hynix Semiconductor Inc.
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Yeo In-seok
Advanced Process Team Memory R&d Div. Hynix Semiconductor Inc.
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Cho Heung-jae
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Park Dae-gyu
Memory R&d Division Hynix Semiconductor. Inc.
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Park Dae-gyu
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Roh J‐s
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Roh J
Memory Research And Development Division Hynix Semiconductor Inc.
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Yeo I‐s
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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PARK Jin
Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.
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YOON Hee-Koo
Advanced Process Team, Memory R&D Division, Hyundai Electronics Industries Co. Ltd.
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Yeo In-seok
Hyundai Electronics Industries Co.ltd. Memory R&d Division
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Yeo In-seok
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Yoon Hee-koo
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Yoon Hee-koo
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Hwang Jeong-Mo
Advanced Technology Laboratory., LG Semicon Co.,
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Park Jin
Advanced Process Team Memory R&d Division Hyundai Electronics Industries Co. Ltd.
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Hwang J‐m
Hyundai Microelectronics Co. Cheongju Kor
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Hwang Jeong-mo
Hyundai Electronics Industries Co.ltd. Memory R&d Division
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Hwang Jeong-mo
R&d Division Lg Semicon Co. Ltd.
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Hwang Jeong-mo
R&d Division Hyundai Microelectronics Co.
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KIM Younsoo
Advanced Process Development Team, Semiconductor R&D Division, Samsung Electronics Co., Ltd.
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Kim Y
Hynix Semiconductor Inc. Kyoungki‐do Kor
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Park J
Hyundai Microelectronics Co. Ltd. Chungju Kor
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KIL Deok-Sin
Advanced Process-Capacitor, Memory Research & Development Division, Hyundai Electronics Industries
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PARK Jong-Bum
Advanced Process-Capacitor, Memory Research & Development Division, Hyundai Electronics Industries
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YOON Dong-Soo
Advanced Process-Capacitor, Memory Research & Development Division, Hyundai Electronics Industries
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SONG Chang-Rock
Advanced Process-Capacitor, Memory Research & Development Division, Hyundai Electronics Industries
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CHO Ho
Advanced Process-Capacitor, Memory Research & Development Division, Hyundai Electronics Industries
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YU Yong-Sik
Advanced Process-Capacitor, Memory Research & Development Division, Hyundai Electronics Industries
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Hwang Jeong-mo
Advan. Tech. Lab. Lg Semicon Co. Ltd.
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Cho Hag-ju
Process Development Team Semiconductor R&d Center Samsung Electronics Co. Ltd
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Cho H
Samsung Electronics Co. Ltd. Kor
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Hwang J.-m.
Hyundai Electronics Industries Co.ltd. Memory R&d Division
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Park Jong-bum
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Yoon Dong-soo
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Yu Yong-sik
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Kim Younsoo
Advanced Process Development Team Semiconductor R&d Division Samsung Electronics Co. Ltd.
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Kil Deok-sin
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Song Chang-rock
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
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Cho Ho
Advanced Process-capacitor Memory Research & Development Division Hyundai Electronics Industries
著作論文
- Characteristics of TaO_xN_y Gate Dielectric with Improved Thermal Stability
- TaO_xN_y Gate Dielectric with Improved Thermal Stability
- Leakage Current Characteristics of (Ba,Sr) TiO_3 Thin Films Deposited on Ru Electrodes Prepared by Metal Organic Chemical Vapor Deposition