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The Society of Photopolymer Science and Technology (SPST) | 論文
- Polymers with Acid-amplifying Side Chains as Positive-type Photoresists
- Fabrication of Low Dislocation Density GaN Template by Nano-channel FIELO Using Nanoimprint Lithography
- Process and Resist Parameters Influencing the MEEF Values for Sub-90nm Cntact Hole Patterns
- Organic Photofunctional Materials Composed of Azobenzene Derivatives: Liquid-solid Phase Transition in Multi Azobenzene Compounds with Partially Substituted Structures
- Properties of Asymmetric BPDA Based Phenylethynyl Terminated Thermosetting Polyimide and Its Composite
- New Polymer Design by DLS Analysis of Development Defect Detection
- Freezing Material Development for Double Patterning Process
- Non Topcoat Self-freezing Photoresist for Double Patterning Process
- Directed Self Assembly Material Development for Fine Patterning and Pattern Repair
- Photocrosslinking of Blends of Multifunctional Diphenylfluorene Derivatives and Polysilanes Using Visible Light
- STW Gas Sensors using Microplasma-Polymerized Films
- Reactions of Vinyl Ethers and Application to Photoreactive Process
- "Face-On" Oriented π-Conjugated Polymers Containing 1,3,4-Thiadiazole Moiety Investigated with Synchrotron GIXS Measurements: Relationship between Morphology and PSC Performance
- Surface Relief and Porous Structure Patterning of Polyimide
- The Performances and Challenges of Today's EB Lithography and EB-resist Materials
- Optical Observation of Deep Bulk Damage in Amorphous Perfluorocarbon Films Produced by UV Photons Emitted from Low-Pressure Argon Plasma
- Effect of Alkyl Group on the Photocrosslinking of Alkyl Methacrylate Based Copolymers
- Studies on Photodecomposition of an Oxime Sulfonate
- Indocyanine Green-lactosome and Near-infrared Light-based Intraoperative Imaging and Photodynamic Therapy for Metastatic Bone Tumors
- Reduction of the Outgassing Segments and LWR Improvement for the Next Generation EUV Lithography