Optical Observation of Deep Bulk Damage in Amorphous Perfluorocarbon Films Produced by UV Photons Emitted from Low-Pressure Argon Plasma

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概要

• 論文の詳細を見る

• In plasma processing, UV photons generate damage deep in the bulk of transparent materials such as amorphous polymers and glass. In this article, we propose the use of total internal reflection fluorescence microscopy for the nondestructive and highly sensitive detection of UV-induced deep bulk damage and for the first time demonstrate the three-dimensional profiling of UV penetration and optical damage production inside amorphous perfluorocarbon films. Weak fluorescence from damaged molecules, whose original chemical structure was altered through bond breaking and reconstruction, was detected up to several hundred nanometers below the surface after exposure to argon plasma.

• The Society of Photopolymer Science and Technology (SPST)の論文

著者

• Ono Takao

  School Of Engineering Nagoya University

• Funatsu Takashi

  Japan Science and Technology Agency, CREST

• Akagi Takanori

  Japan Science and Technology Agency, CREST

• Ichiki Takanori

  School of Engineering, The University of Tokyo

• Iizuka Ryo

  Japan Science and Technology Agency, CREST

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• Optical Observation of Deep Bulk Damage in Amorphous Perfluorocarbon Films Produced by UV Photons Emitted from Low-Pressure Argon Plasma

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