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The Society of Photopolymer Science and Technology (SPST) | 論文
- Photoinduced Surface Relief Grating Formation Using Azobenzene-based Molecular Materials: A New Photochromic Amorphous Molecular Material, N-(biphenyl-4-yl)-N-(4'-methoxybiphenyl-4-yl)-4-phenylazoaniline
- The Impact and Optimization of EUV Sensitive Si Hardmask for Sub-20nm Patterning in EUVL with NTD Process
- Inhomogeneity of PAGs in Resist Film studied by Molecular Dynamics Simulations
- A Study of an Organic Bottom Antireflective Coating for 157-nm Lithography
- Preparation of Carbon-Based Catalysts for PEFC from Nitrogen-Containing Aromatic Polymers
- The Physics of EUV Photoresist and How It Drives Strategies for Improvement
- Organic Field-effect Transistors Based on Vapor Deposited 2,9-Dialkylpentacene Films
- Organic Underlayers for EUV Lithography
- Positive-Working Photosensitive Alkaline-Developable Polyimide Precursor Based on Semi-Alicyclic Poly(amide acid), Vinyl Ether Crosslinker, and a Photoacid Generator
- Surface Segregation Analysis of Hydrophobic Additive of Non-topcoat Resist
- Supercritical Carbon Dioxide Compatible Salts: Synthesis and Application to Next Generation Lithography
- Orthogonal Processing: A Novel Photolithographic Patterning Method for Organic Electronics
- Effect of amide bond in gate dielectric polymers on memory performance of organic field-effect transistors
- Rheological Properties of UV-curable Flexographic Ink
- Study of the Outgassing from the ArF CA Resist during ArF (193nm) Exposure
- Preparation of Polymer Composite Upconversion Phosphor from Inorganic Particles
- Organic Solar Cells Based on Ternary Blend Active Layer of Two Donors PTB7, P3HT and Accepter PC61BM
- High Efficient Photoinitiator of Hexaphenylbisimidazole Derivatives with Substituents in the 2-Phenyl Ring
- Synthesis of Allene Derivatives and their Photophysical Processes
- Quick Formation of DSA Neutralization Polymer Layer Attached by Reactive Self-Assembled Monolayer