Organic Underlayers for EUV Lithography
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概要
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The density, absorbance, and outgassing of underlayer films and the effect of EUV irradiation on such films were evaluated. The relationship between density and calculated EUV absorbance was determined. Films having lower film density have lower EUV absorbance, but this phenomena can be offset by adding a halogen into the polymer matrix. Most materials have low outgassing during EUV exposure when compared to industry standard targets. Surface analysis using contact angle and optical characterization showed good stability of underlayer films under EUV irradiation.
- The Society of Photopolymer Science and Technology (SPST)の論文
The Society of Photopolymer Science and Technology (SPST) | 論文
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