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The Society of Photopolymer Science and Technology (SPST) | 論文
- Pathway to sub-30nm Resolution in EUV Lithography
- Evaluation of a Negative 193nm DUV Resist for the 45nm Node: Lithography, Degradation Kinetics during Etch and Implant.
- Approaches for 193nm and 248nm First and Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings (DBARC)
- Electrical Via Chain Yield for DSA Contact Hole Shrink Process
- Investigation of Polymer-bound PAGs: Synthesis, Characterization and Initial Structure/Property Relationships of Anion-bound Resists
- Electric Conductivity in the Complex of Mesoionic anhydro-3-Hydroxythiazolo[3,2-a]pyridinium Hydroxide with Iodine
- Deposition of SiO2 Thim Films by Atmospheric Pressure Glow Plasma on Polycarbonate
- Development of Carbon Rich Spin-on Sidewall Material
- Alkaline-developable and Positive-type Photosensitive Polyimide based on Fluorinated Poly(amic acid) from Diamine with High Hydrophobicity and Fluorinated Diazonaphtoquinone
- Photo-Induced Radical Polymerization Sensitized by Benzoquinonylsulfanyl Derivatives
- Strategy for Improvement of Non-flammability in Functional Polyimides
- Efficient Synthesis of Block Copolymers Bearing Donor-Acceptor Chromophores for Second-Order Nonlinear Optical Applications
- Immobilization of PEGDA on a PE Surface by Plasma Treatment
- Cu/Polyimide Multilayer Interconnections Fabricated by Nanoimprint at Every Lithography Process
- High Refractive Index Positive Tone Photo-sensitive Coating
- Functionalization of Polymer Surface for Nerve Repair
- Line Edge Roughness in Chemically Amplified Resist: Speculation, Simulation and Application
- Grafting of Polyelectrolyte on Porous Substrate by Plasma-induced Polymerization
- Synthesis of n-Type Semiconductors based on Heterocycles and Application to FET Devices
- Photocurrent Generators Derived from Non-Covalently Assembled Cyclodextrin Nano-System