スポンサーリンク
The Society of Photopolymer Science and Technology (SPST) | 論文
- Standing-wave Effect in Photoresist with and without HMDS
- F2 Resist Based on Methacrylonitrile/2-Trifluoromethylacrylate Copolymers
- Thermally Stable Carbamates as Novel Photobase Generator
- I-Line Sensitive Photoacid Generators and Their Use for Photocrosslinking of Polysilane/diepoxyfluorene Blend
- Non-ionic Photoacid Generators Sensitive to 365nm Light-Synthesis and Applications to Photocrosslinking Systems-
- Non-Chemically Amplified EUV Resist Based on PHS
- i-Line Sensitive Photoacid Generators Using Thianthrenium Derivatives
- Evaluation of Template Release Energy with Use of Fluorinated Segregation Agents for UV Nanoimprint Resists
- Evaluation of Next Generation Fluids for ArF Immersion Lithography Beyond Water
- Structural Changes of Photoresist on Wafer Studied by Pyrolysis-GC/MS Combined with Micro-GPC
- High Temporal Resolution Measurements of Shrinkage Characteristics of UV Nanoimprint Rresin
- Fabrication of Organic Thin-Film Transistor Using Soluble Dibenzochrysene
- Polycrystallization of a Hole Transport Material on Indium-Tin-Oxide Substrates
- Control of Electroluminescence Spectra Using Hole-Blocking Layer for White Organic Light-Emitting Diodes
- Novel and Efficient Dye-linked Photoinitiator generating a Radical via an Intramolecular Electron-transfer Process
- Pattern Collapse Improvement in ArF Resist: Effect of Surfactant-added Rinse and Soft Bake
- ArF Bi-layer Resist for sub-90nm L/S Fabrication
- A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure
- Porphyrin-Dye Sensitized Solar Cell Utilizing Nitroxide Radical Mediator
- Hole-Transporting Property of Star-shaped Nitroxide Radical Molecule