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The Society of Photopolymer Science and Technology (SPST) | 論文
- Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone
- Status of High-Index Materials for Generation-Three 193nm Immersion Lithography
- Hydrophilization of Amorphous Perfluoropolymer using Low-pressure Argon Plasma
- Evaluation of Microvalves Developed for Point-of-Care Testing Devices Using Shape-Memory Polymers:
- Tailoring Surface Properties of ArF Resists with Functionally Graded Materials (FGM)
- Two-step Radical Grafting onto Polypropylene Fiber Initiated by Active Species Prepared through the Irradiation of Electron Beam
- Novel Ion Implantation Process with High Heat Resistant Photoresist in Silicon Carbide Device Fabrication
- Lithography Process Simulations using OCTA -Application to Development and DSA
- Artificial Proteins that Interface between Biological and Inorganic Materials
- Influence of Acid Diffusion Length on Line Edge Roughness in KrF Photoresists
- Influence of Exhaust Pressure on Photosensitivity in Photo-definable Polyimide
- Design and Development of Novel Monomers and Copolymers for 193-nm Lithography
- Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism
- Preparation of Nanopatterned Polyimide by Imprinting and Curing Phenylethynyl- terminated Imide Oligomer
- Freezing Materials For Double Patterning
- Diphenyliodonium Salts with Diazoxide Group for a Photo-acid Generator in Chemically Amplified Resist.
- Visible-Light-Sensitive Photo-Acid Generator Incorporating Food Dye for Use in Chemically Amplified Resists
- A Novel Negative-tone Photopolymer Based on the Photo-initiated Cationic Polymerization of Epoxides in a Polymer Film
- Soft-optoelectronics Materials: Efficient Utilization of Molecular Alignment by Prism Couplers
- Gamma-ray Irradiated Organic Thin Film Transistors Based on Perfluoropentacene with Polyimide Gate Insulator