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The Society of Photopolymer Science and Technology (SPST) | 論文
- Design Considerations for EUV Resist Materials
- Comparison Molecular Orientation of Photoinduced Liquid Crystalline Polymer induced by Thermal Nanoimprinting to that by Graphoepitaxy
- Molecular Orientation of Photoinduced Liquid Crystalline Polymer with 3D Structure fabricated by Thermal Nanoimprinting
- New Fabrication Method of Self-written Waveguide by Using Photosensitive Polyimide
- Colorless Polyimides Derived from Cycloaliphatic Tetracarboxylic Dianhydrides with Controlled Steric Structures (4). Applications to Positive-type Photosensitive Polyimide Systems with Controlled Extents of Imidization.
- Hydroxyamide-containing Positive-type Photosensitive Polyimides
- Low Temperature Film-fabrication of Hardly Soluble Alicyclic Polyimides with High Tg by a Combined Chemical and Thermal Imidization Method
- EUV Resist Chemical Reaction Analysis using SR
- Depth Profile Analysis of Structures in ArF Resists by 172nm VUV Curing and Dry Etching Process Using .MU.-FTIR with Gradient Shaving Preparation
- Improvement in 193 nm Photoresists Performance by 172 nm VUV Curing
- A Novel Resist Freeze Process for Double Imaging
- Preparation and Dielectric Property of Photo-Curable Polysilsesquioxane Hybrids
- Nanopatterning of Vapor-deposited Aminosilane Film using EB Lithography for Ferritin Protein Adsorption
- Facile Preparation of Hybrid Thin Films with Pd Catalysis for Electroless Plating
- Design and Development of Developable BARCs (DBARCs) for Advanced Lithographic Applications
- Pursuit of Lower Critical Dimensional Uniformity in EUV Resists
- Micro-fabrication of Biodegradable Polymers using Focused Ion Beam
- Development of a Compact X-ray Source and Super-sensitization of Photo Resists for Soft X-ray Imaging
- Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings
- Functional Properties of Novel Metallic Hard Masks