Freezing Materials For Double Patterning
スポンサーリンク
概要
- 論文の詳細を見る
Cost reduction of Double Patterning processes is one of the key areas of development for materials vendors. Among the various possible approaches, spin-on freeze coatings are particularly attractive since they can provide a combination of high imaging performance and high flexibility in terms of resist selection. This paper reports on the development of a new material for spin-on freeze double patterning, AZ(r) SOLIDTM</suo> Coating. A suggested mechanism of action is proposed based on FT-IR studies, and the performance of the material in terms of structure quality, process window, impact on LWR, CD uniformity, and resist compatibility is described.
- The Society of Photopolymer Science and Technology (SPST)の論文
The Society of Photopolymer Science and Technology (SPST) | 論文
- Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)
- Conventional Measurement Method of Film Resistance of Plasma-Polymerized Thin Films Using a High-Resistance Meter
- Synthesis and Optical Properties of Carbazole-Containing Donor-Acceptor Type Conjugated Polymers
- Novolak Resist Removal Using Laser (266/532nm)
- Evaluation of Fluorinated Diamond Like Carbon as Antisticking Layer by Scanning Probe Microscopy