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The Society of Photopolymer Science and Technology (SPST) | 論文
- Strategies for High Transparency Acrylate Resists for 157 nm Lithography
- Osmotic Pressure Expression with Several Guest Ions on a Molecular Recognition Ion Gating Membrane
- Influence of ArF Resist Components and Process Conditions on the PEB Sensitivity
- Synthesis and Properties of Sulfonated Polyimides from Sulfophenoxy Benzidines
- Innovative and Tailor-made Resist and Working Stamp Materials for Advancing NIL-based Production Technology
- Influence of Sensitizer on Two-photon Initiated Polymerization (TPIP) in Photoresist SU-8
- Synthesis and Evaluation of Adamantane-Containing Fluorinated Block Copolymers for Resist Modifers in Immersion Lithography
- Study of Leaching Analysis of Immersion Resist Components using the WEXA-2 System
- Spin-on Trilayer Approaches to High NA 193nm Lithography
- KPFM observation for Photo-assisted Formation of Donor-acceptor Spatial Distribution in Organic Photovoltaic Devices
- Carrier Mobility in Organic Thin-film Transistors: Limiting Factors and Countermeasures
- Quinoxaline-Based Donor Polymers for Organic Solar Cells
- Moving-mask Lithography for 3D Microstructure Molding
- A Surface-Silylated Single-Layer Resist Using Chemical Amplification for Deep UV Lithography: IIIb. Optimization of PAG and Its Content
- Single Crystal Organic Field-effect Transistors Based on 2,8-Diphenyl and Dinaphthyl Chrysenes
- Polyphenol-Based Positive-Tone EB Resist-Resist Shade Mask-
- New Aqueous-base Soluble Resin and Its Applicationto Negative and Positive Tone EB Resists for Mask-making
- Micro-sized Columnar Structures of Ni fabricated by using Negative-type Micromold made of Photocurable Resin
- Surface Wettability Controllable Polyimides Having Natural Product Skeletons by UV Light Irradiation
- Large Scale Synthesis of Novel Dendritic Polyenes to Apply to High Sensitive Thiol-ene Photopolymer Systems