New Aqueous-base Soluble Resin and Its Applicationto Negative and Positive Tone EB Resists for Mask-making
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概要
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Acid-catalyzed condensation resins of naphthol compounds (1-Naphthol/1,6- Dihydroxynaphthalene (1,6-DHN)) with 2,6-Bis(hydroxymethyl)-p-cresol (BHMC) were investigated for photo-mask materials shading that has a 248-nm wavelength. The new naphthol resins were aqueous-base soluble and have sufficiently large optical density (Absorbance>11/?m) at the wavelength. The new resins have alternative structures of naphthol units bonded p-cresol by a methylene bridge. Evaluated trial naphthol-resin-based negative and positive EB resists showed sub-micrometer resolution (0.5?m lines and spaces) and high absorbance, 9/μm and 12/μm, respectively, at a wavelength of 248 nm.
- The Society of Photopolymer Science and Technology (SPST)の論文
The Society of Photopolymer Science and Technology (SPST) | 論文
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