スポンサーリンク
The Society of Photopolymer Science and Technology (SPST) | 論文
- Role of Bilayer Resist in 157 nm Lithography
- Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer
- Evaluation of New Molecular Resist for EUV Lithography
- New Fluorinated Resins for 157 nm Lithography Application
- Organic Solvent-Free Reworkable Photocrosslinking System
- Thermal Imprint of P3HT and PCPDTBT: Layer Preparation and Imprint Temperature
- The Photopolymer Science and Technology Award
- Analysis for Drying Behavior of Rinse Water Depended on Resist Pattern Arrangement
- Analysis on Deterioration Mechanism of Release Layer in Nanoimprint Process
- Barton Esters as New Radical Photoinitiators for Flat Panel Display Applications
- PAG Incorporated Polymeric Resists for Sub-100nm Patterning at 193nm Exposure
- Studying Effect of UV Curing on Physical Properties and Wet Etch Resistance of Perhydro-polysilazane-based Inorganic Spin-on-glass (PSZ-SOG) Film
- Characterization of SiO2 Surface Treated by HMDS Vapor and O2 Plasma with AFM Tip.
- Preparation of Expanded Poly (tetrafluoroethylene) Films Grafted by Oxygen Plasma Pretreatment and Immobilization of Lipase
- Detection of Carboxyl Ylide Evidenced by Laser Flash Photolysis of (Biphenyl-4-yl)chlorodiazirine in the Presence of Carbon Dioxide
- Nanoimprinting Using Highly Ordered Anodic Porous Alumina with Reduced Hole Periods
- Comparison of Resist Family Outgassing Characterization between EUV and EB
- High Resolution Positive-Working Molecular Resist Derived from Truxene
- A New Monocyclic Fluoropolymer for 157-nm Photoresists
- Development of Photosensitive Self-Assembled Monolayer Using Silane Coupling Agents Containing 2-Nitrobenzyl Esters Implied for Application to Cell Array