Analysis on Deterioration Mechanism of Release Layer in Nanoimprint Process
スポンサーリンク
概要
The Society of Photopolymer Science and Technology (SPST) | 論文
- Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)
- Conventional Measurement Method of Film Resistance of Plasma-Polymerized Thin Films Using a High-Resistance Meter
- Synthesis and Optical Properties of Carbazole-Containing Donor-Acceptor Type Conjugated Polymers
- Novolak Resist Removal Using Laser (266/532nm)
- Evaluation of Fluorinated Diamond Like Carbon as Antisticking Layer by Scanning Probe Microscopy