Analysis for Drying Behavior of Rinse Water Depended on Resist Pattern Arrangement

概要

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In the resist pattern development process, the drying behavior of the rinse water affects strongly to pattern fabrication properties such as pattern collapse, bubble capture, micro defect adhesion and so on. In order to analyze the drying speed depending on pattern arrangement, line/space and dot array patterns are fabricated. By the precipitation experiment of a solute substance, the drying behavior of the rinse water is clarified. The rinse water is more likely to remain at the dot array patterns as compared with the line/space patterns. Particularly, pinning effect which causes liquid trap around resist pattern is employed in order to explain the drying behavior. The drying model of the rinse water depended on the pattern arrangement can be constructed.
The Society of Photopolymer Science and Technology (SPST)の論文