Study of Leaching Analysis of Immersion Resist Components using the WEXA-2 System
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概要
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The resist components that leach out during ArF immersion exposure can contaminate the scanner lens. For this reason, a method for identifying the amount of leaching that might occur would be of high interest. A project team consisting of members from IMEC and IBM has developed the WEXA-2, an analytical system that accurately determines the amount leached of resist components. We obtained a WEXA-2 system and measured the amount leached from an ArF immersion resist. This report discusses the measurement method used. Both PAG-derived cations and anions can leach from ArF immersion resists during immersion exposures; of the two, anions constitute the primary cause of lens contamination. We immersed an unexposed resist in immersion liquid and assessed the immersion liquid collected to determine the amount of anions, applying the LC/MS/MS method. Based on these measurements, we derived leaching rates.
- The Society of Photopolymer Science and Technology (SPST)の論文
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