Moving-mask Lithography for 3D Microstructure Molding

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概要

• 論文の詳細を見る

• Backside lithography with a moving mask UV exposure technique is proposed. A novel moving-mask exposure apparatus was developed and evaluated both experimentally and through exposure simulations. The backside exposure using this technique was validated and is capable of producing tapered microstructures of thick photoresist for molding. The shape of the structure can be modified by the trajectory of the stage movement. It was confirmed that the shape of the processed structure could be successfully predicted using the proposed simulation method.

• The Society of Photopolymer Science and Technology (SPST)の論文

著者

• Kato Nobuhiro

  Department of Biomedical Engineering, Faculty of Biology Oriented Science and Technology, Kinki University

• Kai Takahisa

  Department of Biomedical Engineering, Faculty of Biology Oriented Science and Technology, Kinki University

• Hirano Masakazu

  Kyokko-Seiko Corp.

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• Moving-mask Lithography for 3D Microstructure Molding

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