Reactive Ion Beam Etching of In-Containing Compound Semiconductors in an Inductively Coupled Cl_2/Ar Plasma
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-01-15
著者
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Lee J.
Department of Biomedical Engineering, Kyungpook National University Hospital
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Lee J.
Department Of Optical Engineering Inje University
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SHUI R.
Sandia National Laboratories
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VAWTER G.
Sandia National Laboratories
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ABERNATHY C.
Department of Materials Science and Engineering, University of Florida
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PEARTON S.
Department of Materials Science and Engineering, University of Florida
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HAHN Y.
School of Chemical Engineering and Technology, Chonbuk National University
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