Effects of Interface Resistance Asymmetry on Local and Non-local Magnetoresistance Structures (Special Issue : Solid State Devices and Materials)
スポンサーリンク
概要
著者
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Saito Yoshiaki
Advanced Research Lab Toshiba Corp.
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Tanamoto Tetsufumi
Advanced LSI laboratory, Corporate R&D Center, Toshiba Corporation, 1 Komukai Toshiba-cho, Saiwai-ku, Kawasaki 212-8582, Japan
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Tanamoto Tetsufumi
Advanced LSI Technology Laboratory, Toshiba R&D Center, Kawasaki 212-8582, Japan
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Ishikawa Mizue
Advanced LSI Technology Laboratory, Toshiba R&D Center, Kawasaki 212-8582, Japan
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Sugiyama Hideyuki
Advanced LSI Technology Laboratory, Toshiba R&D Center, Kawasaki 212-8582, Japan
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Inokuchi Tomoaki
Advanced LSI Technology Laboratory, Toshiba R&D Center, Kawasaki 212-8582, Japan
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