Nickel nanocrystals embedded in metal-alumina-nitride-oxide-silicon type low-temperature polycrystalline-silicon thin-film transistor for low-voltage nonvolatile memory application (Special issue: Microprocesses and nanotechnology)
スポンサーリンク
概要
著者
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Hsieh Ing-Jar
Department of Electric Engineering, Chung Hua University, Hsinchu 30012, Taiwan
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Kuo Cheng-Tzu
Department of Materials Science and Engineering, MingDao University, Changhua 523, Taiwan
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Wu Chien-Hung
Department of Electronics Engineering, Chung Hua University, Hsinchu 30012, Taiwan, R.O.C.
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Wang Terry
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30050, Taiwan
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Lu Tien-Lin
Department of Electric Engineering, Chung Hua University, Hsinchu 30012, Taiwan
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Liu Yu-Cheng
Department of Electric Engineering, Chung Hua University, Hsinchu 30012, Taiwan
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