Kuo Cheng-Tzu | Department of Materials Science and Engineering, MingDao University, Changhua 523, Taiwan
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概要
- Kuo Cheng-Tzuの詳細を見る
- 同名の論文著者
- Department of Materials Science and Engineering, MingDao University, Changhua 523, Taiwanの論文著者
関連著者
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Kuo Cheng-Tzu
Department of Materials Science and Engineering, MingDao University, Changhua 523, Taiwan
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Hsieh Ing-Jar
Department of Electric Engineering, Chung Hua University, Hsinchu 30012, Taiwan
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Wu Chien-Hung
Department of Electronics Engineering, Chung Hua University, Hsinchu 30012, Taiwan, R.O.C.
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Wang Terry
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30050, Taiwan
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Lu Tien-Lin
Department of Electric Engineering, Chung Hua University, Hsinchu 30012, Taiwan
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Liu Yu-Cheng
Department of Electric Engineering, Chung Hua University, Hsinchu 30012, Taiwan
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Wu Jun
Department Of Applied Physics The University Of Tokyo
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Pan Fu-ming
Department Of Materials Science And Engineering National Chiao Tung University
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Kuo Cheng-Tzu
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 30050, Taiwan
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Kuo Cheng-Tzu
Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu 30010, Taiwan
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Wang Ying-Lang
Department of Electrical Engineering, National Chi-Nan University, Nan-tou, Taiwan 54561, Republic of China
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Wu Chien-Hung
Department of Microelectronics Engineering, Chung Hua University, Hsinchu 30012, Taiwan
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Hung Shih-Wei
Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan
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Wang Wei-Hsiang
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan
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Pan Fu-Ming
Department of Materials Science and Engineering, National Chiao-Tung University, Hsinchu 30010, Taiwan
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Hong Tasi-Hau
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan
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Tseng Wen-Shou
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu 300, Taiwan
著作論文
- Nickel nanocrystals embedded in metal-alumina-nitride-oxide-silicon type low-temperature polycrystalline-silicon thin-film transistor for low-voltage nonvolatile memory application (Special issue: Microprocesses and nanotechnology)
- Evolution of Fluorine Content with Precipitate Formation in Fluorine-Doped Silicon Oxide
- Iridium Nanocrystal Thin-Film Transistor Nonvolatile Memory with Si3N4/SiO2 Stack of Asymmetric Tunnel Barrier
- Metal Oxide Film for Growing Vertically Aligned Single-Walled Carbon Nanotubes