Application of novel ultrasonic cleaning equipment that uses the waveguide mode for the single-wafer cleaning process (Special issue: Advanced metallization for ULSI applications)
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
著者
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Okano Shoichi
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Han Ki
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Koike Yoshikazu
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo 135-8548, Japan
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Suzuki Kazunari
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan
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Imazeki Yasuhiro
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan
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Soejima Junichiro
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan
関連論文
- Application of novel ultrasonic cleaning equipment that uses the waveguide mode for the single-wafer cleaning process (Special issue: Advanced metallization for ULSI applications)
- Novel Ultrasonic Cleaning Equipment Using Waveguide Mode
- Application of Novel Ultrasonic Cleaning Equipment Using Waveguide mode for Post-Chemical-Mechanical-Planarization Cleaning
- Sensitivity Correction Control of the Ultrasonic Sensor due to Doppler Shift