Han Ki | Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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概要
- Han Kiの詳細を見る
- 同名の論文著者
- Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japanの論文著者
関連著者
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Okano Shoichi
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Han Ki
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Koike Yoshikazu
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Kotoh-ku, Tokyo 135-8548, Japan
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Suzuki Kazunari
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo 135-8548, Japan
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Soejima Jyunichiro
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Koike Yoshikazu
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo 135-8548, Japan
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Suzuki Kazunari
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan
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Imazeki Yasuhiro
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan
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Soejima Junichiro
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan
著作論文
- Application of novel ultrasonic cleaning equipment that uses the waveguide mode for the single-wafer cleaning process (Special issue: Advanced metallization for ULSI applications)
- Novel Ultrasonic Cleaning Equipment Using Waveguide Mode
- Application of Novel Ultrasonic Cleaning Equipment Using Waveguide mode for Post-Chemical-Mechanical-Planarization Cleaning