Novel Ultrasonic Cleaning Equipment Using Waveguide Mode
スポンサーリンク
概要
- 論文の詳細を見る
In this paper, we propose novel cleaning equipment using a waveguide mode, which we call the Megatube. By using the waveguide, it is possible to supply ultrasonic waves at a distance from the sound source without spreading loss and generate cavitation by controlling the input power and dissolved gas concentration. The sound pressure distribution in the waveguide was simulated using the finite-difference time-domain (FDTD) method. Ultrasonic waves propagate along the waveguide without spreading loss and have a periodic waveguide mode. The sound pressure level emitted from the waveguide was measured to confirm the absorption of ultrasonic waves which was found to decrease by 56%/m. One of the loss factors is the absorption by water in a nonlinear sound field. The dependence of the absorption of ultrasonic waves on the input power to the sound source and the dissolved gas concentration was investigated.
- 2009-07-25
著者
-
Koike Yoshikazu
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Kotoh-ku, Tokyo 135-8548, Japan
-
Okano Shoichi
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
-
Suzuki Kazunari
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo 135-8548, Japan
-
Han Ki
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
-
Soejima Jyunichiro
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
関連論文
- Application of novel ultrasonic cleaning equipment that uses the waveguide mode for the single-wafer cleaning process (Special issue: Advanced metallization for ULSI applications)
- Novel Ultrasonic Cleaning Equipment Using Waveguide Mode
- Application of Novel Ultrasonic Cleaning Equipment Using Waveguide mode for Post-Chemical-Mechanical-Planarization Cleaning
- Sensitivity Correction Control of the Ultrasonic Sensor due to Doppler Shift