Application of Novel Ultrasonic Cleaning Equipment Using Waveguide mode for Post-Chemical-Mechanical-Planarization Cleaning
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概要
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In this paper, we propose the application of novel ultrasonic cleaning equipment using a waveguide mode, which we called the Megatube, to post chemical mechanical planarization (CMP) cleaning. Waveguides can be created in a curved shape, and ultrasonic waves of 1 MHz, within the megasonic frequency range, can propagate along such waveguides. It is possible to supply ultrasonic waves at a distance from the equipment, which has the advantage of enabling ultrasonic emission in a narrow space. For single-wafer processing, this technique has the advantage of removing particles, known as slurry residues, from both the front and back sides of the wafer by exposure to ultrasonic waves of megasonic frequency. In the Megatube, cavitation is generated by controlling the input power and the dissolved gas concentration. Particle removal efficiency (PRE) using the Megatube was evaluated for various input powers, waveguide tube lengths, and concentrations of dissolved gas in a cleaning solution.
- 2009-07-25
著者
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Koike Yoshikazu
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Kotoh-ku, Tokyo 135-8548, Japan
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Okano Shoichi
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Suzuki Kazunari
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo 135-8548, Japan
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Han Ki
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Soejima Jyunichiro
Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, 3-1-5 Sakae-cho, Hamura, Tokyo 205-8607, Japan
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Koike Yoshikazu
Faculty of Engineering, Shibaura Institute of Technology, 3-7-5 Toyosu, Koto, Tokyo 135-8548, Japan
関連論文
- Application of novel ultrasonic cleaning equipment that uses the waveguide mode for the single-wafer cleaning process (Special issue: Advanced metallization for ULSI applications)
- Novel Ultrasonic Cleaning Equipment Using Waveguide Mode
- Application of Novel Ultrasonic Cleaning Equipment Using Waveguide mode for Post-Chemical-Mechanical-Planarization Cleaning
- Sensitivity Correction Control of the Ultrasonic Sensor due to Doppler Shift