Thickness Effects on pH Response of HfO2 Sensing Dielectric Improved by Rapid Thermal Annealing (Special Issue: Solid State Devices & Materials)

スポンサーリンク

概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文

著者

• Yang Chia-ming

  Department Of Electronic Engineering Chang Gung University

関連論文

• pH Sensing Performance and Electrical Characterization on Hafnium Oxide Gate ISFETs with Single and Dual Stack Insulator by RF Sputtering
• Novel inorganic pH-insensitive membrane prepared by post N_2O plasma treatment on conventional Si_3N_4/SiO_2 stack layer for REFET application
• Modifications on pH sensitivity of Si_3N_4 membrane by CF_4 plasma and rapid thermal annealing for ISFET/REFET applications
• Thickness Effects on pH Response of HfO2 Sensing Dielectric Improved by Rapid Thermal Annealing (Special Issue: Solid State Devices & Materials)
• Thickness Effects on pH Response of HfO_2 Sensing Dielectric Improved by Rapid Thermal Annealing
• Ion Polarity Dependent Voltage Shifts of SiGe Membrane for pH Sensor
• Chemical Sensing Properties of Electrolyte/SiGe/SiO2/Si Structure
• Residual Clamping Force and Dynamic Random Access Memory Data Retention Improved by Gate Tungsten Etch Dechucking Condition in a Bipolar Electrostatic Chuck
• Thickness Effects on pH Response of HfO2 Sensing Dielectric Improved by Rapid Thermal Annealing

スポンサーリンク