Thickness Dependence of Structural and Electrical Properties of Thin InN Grown by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy
スポンサーリンク
概要
- 論文の詳細を見る
We have succeeded in achieving high-quality thin InN films ({<}500 nm) by low-plasma-power growth. In this study, we investigated the thickness dependence of the structural and electrical properties of relatively thin InN films grown by radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE). InN films were grown by RF-MBE on GaN/sapphire templates at 80 W, which is lower than that for conventional InN growth (200 W). The films had thicknesses of 5, 20, 100, 200, and 460 nm. The mobility and carrier concentration of InN degraded with decreasing InN film thickness, although even 200-nm-thick InN demonstrated relatively good characteristics (\mu = 1540 cm<sup>2</sup>V<sup>-1</sup>s<sup>-1</sup>and \mathrm{n}= 2.1 \times 10^{18} cm<sup>-3</sup>). On the other hand, the FWHM values of the (002) and (302) X-ray rocking curves (XRCs) were minimum in 5-nm-thick InN and increased with film thickness up to approximately 100--200 nm. This seems to be due to the formation of small grains with better crystal quality at the initial stage. It is also suggested that these grain structures with poor coalescence and roughness caused the deterioration of InN electronic properties in a very thin region.
- 2013-08-25
著者
-
Nanishi Yasushi
Ritsumeikan University, 1-1-1 Noji-Higashi, Kusatsu, Shiga 525-8577, Japan
-
Nanishi Yasushi
Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan
-
Araki Tsutomu
Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan
-
Fujishima Tatsuya
Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
-
Sakaguchi Junichi
Ritsumeikan University, Kusatsu, Shiga 525-8577, Japan
-
Matioli Elison
Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
-
Palacios Tomás
Massachusetts Institute of Technology, Cambridge, MA 02139, U.S.A.
関連論文
- High frequency performance of graphene transistors grown by chemical vapor deposition for mixed signal applications (Selected topics in applied physics: Technology, physics, and modeling of graphene devices)
- GaN-Based Trench Gate Metal Oxide Semiconductor Field Effect Transistors with Over 100 cm2/(V s) Channel Mobility
- Photocurrent Phenomena in Nanoribbon InAlN/GaN High Electron Mobility Transistors
- Thickness Dependence of Structural and Electrical Properties of Thin InN Grown by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy
- Thickness Dependence of Structural and Electrical Properties of Thin InN Grown by Radio-Frequency Plasma-Assisted Molecular Beam Epitaxy (Special Issue : Recent Advances in Nitride Semiconductors)
- Photocurrent Phenomena in Nanoribbon InAlN/GaN High Electron Mobility Transistors