Photoluminescence from Eu
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概要
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We found that ZnO:Eu films sputter-deposited with H<inf>2</inf>O vapor gas produce intense photoluminescence from Eu<sup>3+</sup>ions through excitation of ZnO host crystals with a 325-nm laser light, whereas those deposited with O<inf>2</inf>gas do not. At optimum annealing temperatures of 300--500 °C, the primary luminescence from Eu<sup>3+</sup>ions appeared at 612 nm, which was much stronger than the near-band edge and defect emissions from ZnO. After annealing at higher temperatures, the 612-nm peak attenuated, and two emission lines at 612 and 620 nm, corresponding to two distinct chemical sites, had comparable intensities. These observations suggest that incorporating H<sup>+</sup>and/or OH<sup>-</sup>species in ZnO crystals are prerequisite for emissions from Eu<sup>3+</sup>ions to occur. Characterization with infrared absorption spectroscopy and X-ray diffraction suggested that Eu<sup>3+</sup>ions substitute Zn<sup>2+</sup>sites when OH<sup>-</sup>(H<sup>+</sup>) species are contained in ZnO crystals. The role of H<sup>+</sup>and/or OH<sup>-</sup>species may be either charge compensation when substituting Zn<sup>2+</sup>sites with Eu<sup>3+</sup>ions or creation of trapping centers of excited energies that mediate efficient energy transfer from ZnO to Eu<sup>3+</sup>ions.
- 2013-07-25
著者
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Akazawa Housei
Ntt Microsystem Integration Lab. Kanagawa Jpn
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Shinojima Hiroyuki
NTT MI Laboratories, 27-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Akazawa Housei
NTT Microsystem Integration Laboratories, Atsugi, Kanagawa 243-0198, Japan
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Shinojima Hiroyuki
NTT Microsystem Integration Laboratories, Atsugi, Kanagawa 243-0198, Japan
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