Transparent Conductor: TiOxNy
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概要
- 論文の詳細を見る
We propose the feasibility of using TiOxNy films as transparent conductors. The TiOxNy films deposited by electron cyclotron resonance plasma sputtering from a Ti target in the metal mode had a face-centered cubic crystal structure. As deposited films incorporated larger numbers of O and N atoms, their crystallinity approached an amorphous state and optical transparency improved, reflecting the decrease in carrier concentration. Our TiOxNy films extended the controllable range of resistivity and optical transmittance more than that with TiOx and TiNx films and outperformed those produced by conventional magnetron sputtering.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2010-08-25
著者
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Akazawa Housei
Ntt Microsystem Integration Lab. Kanagawa Jpn
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Akazawa Housei
NTT Microsystem Integration Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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- Transparent Conductor: TiOxNy