Effect of Electron Density on Extreme Ultraviolet Output of a Z-Pinch Xe Discharge Produced Plasma Source
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概要
- 論文の詳細を見る
The extreme ultraviolet (EUV) source has many applications, including EUV lithography, EUV diagnostics, and so on. Numerous research groups have developed many EUV light sources and studied their characteristics. In this paper, we measured the temporal EUV emission of a Xe discharge produced plasma (DPP) EUV source and later, attempted to clarify the relationship between electron density evolution and EUV emission. The maximum EUV emission occurred at the optimum electron density of about 10^{19} cm-3. A preliminarily discussion of the relationship between EUV radiation and electron density evolution based on these experimental results is presented.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2011-06-25
著者
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Watanabe Masato
Department Of Energy Sciences Tokyo Institute Of Technology
-
Hotta Eiki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Tokyo Institute Of Techno
-
Huang Bin
Department Of Chemistry Wuhan University
-
Takimoto Yasuhiro
Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
-
Hotta Eiki
Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
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Watanabe Masato
Department of Energy Sciences, Interdisciplinary Graduate School of Science and Engineering, Tokyo Institute of Technology, Yokohama 226-8502, Japan
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