Experimental Investigations on Ballistic Transport in Multi-Bridged Channel Field Effect Transistors
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概要
- 論文の詳細を見る
Electrical characteristics of multi bridged channel field effect transistor (MBCFET) with various channel lengths ($L$) ranging from 500 to 48 nm have been investigated. The current--voltage characteristics do not show any sign of short channel effect due to surrounding gate structures. The gate bias power law of the drain saturation current, mobility, and ballistic efficiency as functions of $L$ show mixed features of drift-diffusion and ballistic transport. The channel resistance shows anomalous decrease when $L\leq 60$ nm, which is related with the transconductance overshoot resulted in ballistic transport at small $V_{\text{DS}}$. Temperature ($T$) dependence of the 100 nm device shows another type of transport region when $T < 40$ K, which can be interpreted as the one-dimensional quantum ballistic regime.
- 2011-04-25
著者
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Park Donggun
Semiconductor R&d Center Samsung Electronics Co. Ltd.
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Kim Dong-Won
Semiconductor R&D Center, Samsung Electronics Co., Ltd., Hwasung, Gyeonggi 445-701, Korea
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Jung Young
Research Center for Time domain Nano-functional Devices and School of Electrical Engineering, Korea University, Seoul 136-713, Korea
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Hwang Sung
Research Center for Time domain Nano-functional Devices and School of Electrical Engineering, Korea University, Seoul 136-713, Korea
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Hong Byoung
Research Center for Time domain Nano-functional Devices and School of Electrical Engineering, Korea University, Seoul 136-713, Korea
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Choi Luryi
Research Center for Time domain Nano-functional Devices and School of Electrical Engineering, Korea University, Seoul 136-713, Korea
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Cho Keun
Semiconductor R&D Center, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea
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Lee Sung-Young
Semiconductor R&D Center, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea
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Cho Keun
Semiconductor R&D Center, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea
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Lee Sung-Young
Semiconductor R&D Center, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea
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Park Donggun
Semiconductor R&D Center, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea
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Kim Dong-Won
Semiconductor R&D Center, Samsung Electronics, Hwasung, Gyeonggi 445-701, Korea
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