Effect of Oxygen Concentration on Characteristics of Ba(Zr0.1Ti0.9)O3 Thin Films Deposited on Indium Tin Oxide/Glass Substrates
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概要
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In this study, the perovskite Ba(Zr0.1Ti0.9)O3 (BZ1T9) ferroelectric thin films deposited on indium tin oxide (ITO)/glass substrates for applications in system-on-panel (SOP) devices are produced and investigated. The optimal sputtering conditions of as-deposited BZ1T9 thin films are an rf power of 160 W, a chamber pressure of 10 mTorr, a substrate temperature of 580 °C, and an oxygen concentration of 40%. The effect of oxygen concentration on the physical and electrical characteristics of BZ1T9 thin films is determined. For different oxygen concentrations, the thickness and deposition rate are calculated by scanning electron microscopy (SEM). From polarization versus electrical field curves, the $2P_{\text{r}}$ value and coercive field of BZ1T9 thin films are determined to be 7 μC/cm2 and 250 kV/cm, respectively. In addition, the maximum dielectric constant, leakage current density, and transmittance within the ultraviolet–visible (UV–vis) spectrum are investigated.
- 2009-09-25
著者
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Yang Cheng-fu
Department Of Chemical And Materials Engineering National University Of Kaohsiung
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Chen Kai-Huang
Department of Electrical Engineering, National Sun Yat-Sen University, Kaohsiung 804, Taiwan, R.O.C.
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Lin Yi-Jun
Department of Electro-Optical Engineering, Southern Taiwan University, Tainan 711, Taiwan, R.O.C.
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Chen Kai-Huang
Department of Electronics Engineering and Computer Science, Tung-Fang Institute of Technology, Kaohsiung 829, Taiwan, R.O.C.
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Chang Chia-Hsiung
Department of Electronics Engineering and Computer Science, Tung-Fang Institute of Technology, Kaohsiung 829, Taiwan, R.O.C.
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