Reactive Ion Etching of NiFe Thin Films from First-Principles Study: A Case Study
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概要
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We propose a reactive ion etching (RIE) process design from first-principles calculations for implementation to NiFe thin-film etching. We consider the interaction between the magnetic metal surface NiFe and various gases. We found that the gases CO/NH3, or CH3OH/O2(/NH3,H2) enable the NiFe surface to be etched.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2005-02-15
著者
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Dino Wilson
Department Of Applied Physics Osaka University
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Akinaga Hiroyuki
Research Consortium For Synthetic Nano-function Materials Project (synaf) National Institute Of Adva
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Kasai Hideaki
Department Of Applied Physics Faculty Of Engineering Osaka University
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Nakanishi Hiroshi
Department Of Biological Science And Technology Tokyo University Of Science
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Diño Wilson
Department of Applied Physics, Osaka University, Suita, Osaka 565-0871, Japan
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Watanabe Susumu
Research Consortium for Synthetic Nano-Function Materials Project (SYNAF), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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Nakanishi Hiroshi
Department of Applied Physics, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Akinaga Hiroyuki
Research Consortium for Synthetic Nano-Function Materials Project (SYNAF), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8568, Japan
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