Study of Interdiffused Layers Near the Surface of Multilayers by Total-Reflection Soft-X-ray Fluorescence Spectroscopy
スポンサーリンク
概要
- 論文の詳細を見る
Using soft-X-ray fluorescence spectroscopy with photon incidence at a critical angle of total reflection, it was made clear that SiO2 existed within a depth of a few nanometers from the surface of Fe/Si multilayers. It was generated by oxidation of the interdiffused Fe3Si layer nearest to the topmost Fe layer. Consequently, the Fe3Si layer was found to decrease in thickness. This result suggests that the total-reflection soft-X-ray fluorescence spectroscopy is fairly useful to analyze the chemical state of elements to a depth of a few nanometers from the surface.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-07-15
著者
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WATANABE Makoto
Institute for Molecular Science
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Kitakami Osamu
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Yanagihara Mihiro
Institute For Solid State Physics The University Of Tokyo:national Laboratory For High Energy Physic
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Hirayama Yushi
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Imazono Takashi
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Ichikura Shigeru
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Imazono Takashi
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Yanagihara Mihiro
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Hirayama Yushi
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Kitakami Osamu
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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