Uniform Magnetic Dot Fabrication by Nanoindentation Lithography
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概要
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A dot array of Co/Pt multilayer was fabricated by combining nanoindentation lithography using an atomic force microscope and an inorganic/organic bilayer resist system in accordance with the work by Hu et al. [J. Vac. Sci. Technol. B 16 (1998) 1983] By elaborate optimization of all processes in the nanoindentation lithography, such as resist materials and indentation depth of a probe tip, extremely uniform Co/Pt multilayer dots with a diameter of 40 nm and very small size dispersion of less than 10% have been successfully fabricated with excellent reproducibility. Magnetic measurements have revealed that the Co/Pt multilayer dots are purely single-domained and exhibit large coercivity with small switching field distribution.
- 2011-04-25
著者
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Okamoto Satoshi
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Kitakami Osamu
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Kikuchi Nobuaki
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Shen Ze
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan
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Hashimoto Tomohiko
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai 980-8577, Japan
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