Interdiffused Layers in Antiferromagnetically Coupled Fe/Si Multilayers Studied by Soft-X-Ray Fluorescence Spectroscopy
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概要
- 論文の詳細を見る
We measured the Si $L_{2,3}$ fluorescence spectrum of an antiferromagnetically coupled Fe (3.0 nm)/Si (1.3 nm) multilayer using undulator synchrotron radiation. We estimated the chemical composition and thickness of Fe silicide layers formed by interdiffusion by curve fitting analysis using the fluorescence spectra of amorphous Fe silicides. We clarified that the amorphous Si layer of 1.3 nm thickness changed in its middle region into amorphous FeSi2 of 0.7 nm thickness, which plays an important role in the strong antiferromagnetic exchange coupling in the Fe/Si multilayer. It was also confirmed that soft-X-ray fluorescence spectroscopy has a high potential for analyzing buried interfaces nondestructively.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-07-15
著者
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WATANABE Makoto
Institute for Molecular Science
-
Kitakami Osamu
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Yanagihara Mihiro
Institute For Solid State Physics The University Of Tokyo:national Laboratory For High Energy Physic
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Hirayama Yushi
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Imazono Takashi
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Ichikura Shigeru
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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