UV-Patterned Polysilane Films as a Phase Mask in Optical Correlation System
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概要
- 論文の詳細を見る
Entirely transparent polysilane films, which were modified by ultraviolet (UV) light exposure to decrease their refractive index, were used as phase masks. The phase modulation amount of the transmitted laser, which was estimated using a Mach–Zehnder interferometer, can be modified linearly by UV exposure dose, indicating that the polysilane films have a very useful property of controllability by UV light exposure. Optical correlation using the polysilane phase masks as the information-carrying medium was then demonstrated. A matched-filter four-wave-mixing optical correlator using a photorefractive (PR) polymer as a real-time holographic data storage medium was used. A large correlation signal difference of over 3.6-fold was obtained for the striped polysilane phase masks that were arranged orthogonally or in parallel. This is due to the distinct encoded images in the polysilane phasemasks originating from the large refractive index modification in polysilane films of approximately $\Delta n=-0.14$ at $\lambda=633$ nm. The high transparency in the entire visible region and such large refractive index modification make polysilane films difficult to forge, and allow us to use phase masks in pattern recognition systems for security verification.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-12-15
著者
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YOKOYAMA Masaaki
Department of Agricultural Chemistry, Faculty of Agriculture, Kyushu University
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Nagayama Norio
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Sato Tetsuo
Departmelet Of Organic Chemistry Tokyo Institute Of Technology Ookayama
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Yokoyama Masaaki
Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Nagayama Norio
Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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